{"id":290,"date":"2022-10-27T13:37:23","date_gmt":"2022-10-27T04:37:23","guid":{"rendered":"http:\/\/webclick0057.webclick.co.kr\/?page_id=290"},"modified":"2025-04-04T16:19:09","modified_gmt":"2025-04-04T07:19:09","slug":"em-development","status":"publish","type":"page","link":"https:\/\/nanocsp.com\/ger\/em-development\/","title":{"rendered":"CHEMICAL entwickelte Produkte"},"content":{"rendered":"

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    \n\t\"null\"\n<\/div><\/div><\/div>\n<\/div>Halbleiter\u00e4tzmittel<\/span><\/div><\/li><\/ul><\/div><\/div>[vc_row_inner el_class=“pl30″][vc_column_inner width=“2\/3″]
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      \n\t<\/i>\n<\/div><\/div><\/div>\n<\/div>TiW-\u00c4tzmittel<\/span><\/div><\/li><\/ul><\/div>[vc_column_text css=“.vc_custom_1742870445935{margin-bottom: 0px !important;}“ el_class=“f16l30 pl15″]<\/p>\n
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      • \u00b7<\/span> E\/R : 400~500A\/min(at 30 \u2103 )<\/li>\n
      • \u00b7<\/span> Under-cut : 1um unten(150% over etch)<\/li>\n
      • \u00b7<\/span> Materials : Al, Cu damage free<\/li>\n<\/ul>\n

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          \n\t\"null\"\n<\/div><\/div><\/div>\n<\/div>Teilereinigung (Nichtmetall)<\/span><\/div><\/li><\/ul><\/div><\/div>[vc_row_inner el_class=“pl30″][vc_column_inner width=“1\/2″]
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            \n\t<\/i>\n<\/div><\/div><\/div>\n<\/div>Dichtungsreinigung<\/span><\/div><\/li><\/ul><\/div>[vc_column_text css=“.vc_custom_1742870523765{margin-bottom: 0px !important;}“ el_class=“f16l30 pl15″]<\/p>\n
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            • \u00b7<\/span> Application : LCD-Prozessspritze \/ Halterung \/ D\u00fcse<\/li>\n
            • \u00b7<\/span> Verbesserte Reinigungskraft im Vergleich zu Aceton<\/li>\n
            • \u00b7<\/span> Materials\u00a0: SUS, PE, PP, PTFE damage free<\/li>\n<\/ul>\n

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                \n\t\"null\"\n<\/div><\/div><\/div>\n<\/div>Teilereinigung (Metall)<\/span><\/div><\/li><\/ul><\/div><\/div>[vc_row_inner el_class=“pl30″][vc_column_inner width=“1\/2″]
                [vc_single_image image=“885″ img_size=“full“ alignment=“center“ css=“.vc_custom_1743751145821{margin-bottom: 0px !important;}“]
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                  \n\t<\/i>\n<\/div><\/div><\/div>\n<\/div>AI\/Plasma-Brandreinigung<\/span><\/div><\/li><\/ul><\/div>[vc_column_text css=“.vc_custom_1742871082925{margin-bottom: 0px !important;}“ el_class=“f16l30 pl15″]<\/p>\n
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                  • \u00b7<\/span> Application : Halbleiter ceramic parts<\/li>\n
                  • \u00b7<\/span> Materials\u00a0: SUS,Ceramic, PVC, PE, PP, PTFE damage free<\/li>\n<\/ul>\n

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                      \n\t\"null\"\n<\/div><\/div><\/div>\n<\/div>Solder remover<\/span><\/div><\/li><\/ul><\/div><\/div>[vc_row_inner el_class=“pl30″][vc_column_inner width=“1\/2″]
                      [vc_single_image image=“878″ img_size=“full“ alignment=“center“ css=“.vc_custom_1743742978690{margin-bottom: 0px !important;}“]
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                        \n\t<\/i>\n<\/div><\/div><\/div>\n<\/div>Solder remover_wafer<\/span><\/div><\/li><\/ul><\/div>[vc_column_text css=“.vc_custom_1666843947794{margin-bottom: 0px !important;}“ el_class=“f16l30 pl15″]<\/p>\n
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                        • \u00b7<\/span> E\/R : 12~15um\/min(at 40\u2103)<\/li>\n<\/ul>\n

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                            \n\t<\/i>\n<\/div><\/div><\/div>\n<\/div>Solder remover_DRAM<\/span><\/div><\/li><\/ul><\/div>[vc_column_text css=“.vc_custom_1742870587086{margin-bottom: 0px !important;}“ el_class=“f16l30 pl15″]<\/p>\n
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                            • \u00b7<\/span> E\/R : 5~7um\/min(at 25\u2103)<\/li>\n
                            • \u00b7<\/span> IMC damage free(Kein Cu-Schutz)<\/li>\n<\/ul>\n

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                                \n\t\"null\"\n<\/div><\/div><\/div>\n<\/div>Invar Mask Total solution<\/span><\/div><\/li><\/ul><\/div><\/div>
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                                <\/div><\/div>[\/vc_column_inner][vc_column_inner width=“1\/3″]
                                [vc_column_text css=“.vc_custom_1742870830767{margin-bottom: 20px !important;}“ el_class=“f24l24 fw400 pl5″]MASKENHERSTELLUNG NACH PROZESS[\/vc_column_text][vc_column_text css=“.vc_custom_1666845189459{margin-bottom: 0px !important;}“ el_class=“f16l30 pl15″]<\/p>\n
                                  \n
                                • \u00b7<\/span> Sliming & Patterning<\/span>
                                  \nCS-313A<\/li>\n
                                • \u00b7<\/span> Laser Pattern Cleaning<\/span>
                                  \nCS-302MC, 303MC<\/li>\n
                                • \u00b7<\/span> PR Cleaning<\/span>
                                  \nCS-550<\/li>\n<\/ul>\n

                                  [\/vc_column_text]<\/div>[\/vc_column_inner][\/vc_row_inner]

                                  <\/div>[vc_row_inner el_class=“pl30″][vc_column_inner width=“2\/3″]
                                  [vc_single_image image=“881″ img_size=“full“ alignment=“center“ css=“.vc_custom_1743743387551{margin-bottom: 0px !important;}“]
                                  <\/div><\/div>[\/vc_column_inner][vc_column_inner width=“1\/3″]
                                  [vc_column_text css=“.vc_custom_1742870846542{margin-bottom: 20px !important;}“ el_class=“f24l24 fw400 pl5″]2. Organischer Ablagerungsfilm und Erstreinigung durch Verfahren[\/vc_column_text][vc_column_text css=“.vc_custom_1742870874758{margin-bottom: 0px !important;}“ el_class=“f16l30 pl15″]<\/p>\n
                                    \n
                                  • \u00b7<\/span> Organischer Ablagerungsfilm und fluoreszierender R\u00fcckstand
                                    \nNMP & CS-700T<\/li>\n
                                  • \u00b7<\/span> Bearbeitungs\u00f6l und elektrolytische Reinigung
                                    \nCS-701AC<\/li>\n<\/ul>\n

                                    [\/vc_column_text]<\/div>[\/vc_column_inner][\/vc_row_inner]

                                    <\/div>[vc_row_inner el_class=“pl30″][vc_column_inner width=“2\/3″]
                                    [vc_single_image image=“882″ img_size=“full“ alignment=“center“ css=“.vc_custom_1743743375514{margin-bottom: 0px !important;}“]
                                    <\/div><\/div>[\/vc_column_inner][vc_column_inner width=“1\/3″]
                                    [vc_column_text css=“.vc_custom_1742870888230{margin-bottom: 20px !important;}“ el_class=“f24l24 fw400 pl5″]3. Reinigung des anorganischen Abscheidungsfilms[\/vc_column_text][vc_column_text css=“.vc_custom_1742870912570{margin-bottom: 0px !important;}“ el_class=“f16l30 pl15″]<\/p>\n
                                      \n
                                    • \u00b7<\/span> Waffenreinigung (AgMg)
                                      \nCS-100SE<\/li>\n
                                    • \u00b7<\/span> Waffenreinigung (LiF)
                                      \nCS-701AC<\/li>\n<\/ul>\n

                                      [\/vc_column_text]<\/div>[\/vc_column_inner][\/vc_row_inner][vc_separator color=“custom“ css=“.vc_custom_1666839076096{margin-top: 80px !important;margin-bottom: 80px !important;}“ accent_color=“#dddddd“]

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